FUJIFILM Corporation today announced that two representatives from its Electronic Materials Research & Development Center, Keiyu Ou and Akihiro Hakamata, will present two papers on their latest research on advanced lithography technologies (specifically EUV Resist and EUV Developer as well as Nanoimprint Resist), at the SPIE Advanced Lithography + Patterning 2025 Conference (SPIE 2025). SPIE 2025 is a world-renowned international conference where leaders of the semiconductor industry, researchers and engineers gather to share the latest advancements and technological innovations related to semiconductor lithography technologies. The event will take place February 23-27, 2025, in San Jose, California.
More on Fujifilm’s research topics:
EUV Resist and EUV Developer
Fujifilm was the first in the world to develop and commercialize the NTI process, which has helped to pave the way in the miniaturization of semiconductor circuits using ArF lithography. By providing negative-tone EUV resist and EUV developer compatible with the evolved NTI process for EUV, Fujifilm optimizes the circuit pattern formation process. By utilizing the functional molecule technology cultivated through its development of conventional photoresists, Fujifilm’s process maintains a uniform acid concentration within the resist film during EUV exposure, which enables reduced fluctuation in circuit patterns, by approximately 17% .
In her presentation, Fujifilm’s Keiyu Ou will showcase her research on “solvent developer type negative EUV resist” technology, which was developed as an improvement upon the currently mainstream “alkali developer type positive EUV resist.” The research suggests that by using the newly developed EUV developer solution, it is possible to achieve high resolution of circuit patterns, which will be presented in Fujifilm’s future roadmap for EUV CAR-NTD. It also introduces various patterning examples that support pillar patterns and hole patterns as well as line patterns. In addition, at SPIE 2025, research results that support the practical application of EUV CAR-NTI are scheduled to be announced by other companies, and the potential for development of this technology is expected.
To view the research abstract, visit:
Fujifilm’s Nanoimprint Resist
Fujifilm’s nanoimprint resist can fill the complex circuit patterns engraved on the mask to ensure the transfer and formation of nanometer-level circuit patterns. Further, after curing with UV irradiation, the resist exhibits mold release properties that prevent defects in the circuit patterns transferred to the resist even when the mask is peeled off at high speed. This enables improvements in throughput (patterning processing capacity per hour) and yield due to low defects, which were issues in the practical application of nanoimprint lithography (NIL), and contributes to cost reduction in advanced semiconductor manufacturing.
Akihiro Hakamata will present his research on semiconductor device manufacturing using NIL, in which the company has successfully developed nanoimprint resists by designing and synthesizing functional materials such as monomers, adhesives, and release agents that can be applied to various processes such as resist coating, resist filling, and release using inkjet printing. In this presentation, Hakamata will introduce the material technology developed to achieve the features of Fujifilm’s nanoimprint resists, as well as the adhesion agent developed specifically for this purpose.
To view the research abstract, visit:
“SPIE is the premier event for semiconductor lithography technology,” said Tetsuya Iwasaki, Director, corporate vice president, FUJIFILM Corporation and general manager of the FUJIFILM Electronic Materials business division. “As a key supplier of materials for two cutting-edge semiconductor technology fields, EUV and nanoimprint lithography, we are looking forward to presenting our research on these key topics at SPIE in order to help further the critical field of lithography.”
For more information about FUJIFILM Electronic Materials., visit https://www.fujifilm.com/em-
