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Ruthenium Nanolayers are Ferromagnetic at RT

Researchers from Intel Corporation and the University of Minnesota and the University of Wisconsin have shown that strained atom-scale films of pure ruthenium (Ru) metal exhibit ferromagnetism at room temperature, openning up the possibility of using the material to build…

Mott Memristor Chaos could make Efficient AI

Congratulations to Suhas Kumar, John Paul Strachan, and R. Stanley Williams of Hewlett Packard Labs in Palo Alto for showing not just how to make a Mott memristor, but that you can create controlled chaos with one. “We showed that…

PCM + ReRAM = OUM as XPoint

The good people at TECHINSIGHTS have reverse-engineered an Intel “Optane” SSD to cross-section the XPoint cells within (http://www.eetimes.com/author.asp?section_id=36&doc_id=1331865&), so we have confirmation that the devices use chalcogenide glasses for both the switching layer and the selector diode. That the latter…

MEMS Mirrors for LIDAR

Clever integration of new microelectronic/nanoelectronic technologies will continue to provide increased functionalities for modern products. Light Imaging, Detection, And Ranging (LIDAR) technology uses lasers to see though fog and darkness, and smaller less expensive LIDAR systems are needed for autonomous…

Moore’s Law Smells Funny

…maybe we need “Integrated Cleverness Law” “Jazz is not dead, it just smells funny.” – Frank Zappa 1973 from Be-Bop Tango (Of The Old Jazzmen’s Church) Marketing is about managing expectations. IC marketing must position next-generation chips as adding significant…

EUVL Masks may need to be Tool-Specific

Extreme Ultra-Violet Lithography (EUVL) keeps hurting my brain. Just when I can understand how it could be used in profitable commercial high-volume manufacturing (HVM) I hear something that seriously strains my brain. First it was the mirrors and mask in…

Flagello to receive Zernike Award at SPIE Advanced Lithography

Donis Flagello, president, CEO, and COO of Nikon Research Corporation of America (NRCA), will be presented with the 2017 Frits Zernike Award for Microlithography on Monday 27 February during SPIE Advanced Lithography in San Jose, California. The award, presented annually…

Photoelectric measure of atomically thin stacks

A team led by researchers at the University of Warwick have discovered a breakthrough in how to measure the electronic structures of stacked 2D semiconductors using the photoelectric (PE) effect. Materials scientists around the world have been investigating various heterostructures…

XMC becomes YRST or Changjiang Storage

As reported by Digitimes, a major enterprise in Wuhan, China has broken ground on the first of three mega-fabs to produce 3D-NAND chips. The final fab name-plate may ultimately read XMC or YMTC or YRST or possibly Changjiang Storage (not…

China to be 15% of World Fab Capacity by 2018

Currently there are eight Chinese 300mm-diameter silicon IC fabs in operation as 2016 comes to a close. Chinese IC fab capacity now accounts for approximately 7% of worldwide 300mm capacity, as reported by VLSIresearch in a recent edition of its…