The AI Revolution is in full swing. However, the history of AI clearly shows that nothing can be taken for granted.
ISS: 2020 Outlook for EUV
At SEMI’s 2020 Industry Strategy Symposium (ISS), held January 12-15th at Half Moon Bay in California, Marco Pieters, Vice President, EUV Product Marketing, ASML provided a status report on EUV’s acceptance in high volume manufacturing and an update on progress toward the company’s next-gen high NA tool.
ISS: 2020 Outlook on Automotive Electronics
At SEMI’s 2020 Industry Strategy Symposium (ISS), held January 12-15th at Half Moon Bay in California, Ken Washington, CTO, Ford Motor Company, who described a vision for cars of the future and their requirements when it comes to connectivity and compute power.
ISS: The 2020 Outlook for Consumer Electronics
At SEMI’s 2020 Industry Strategy Symposium (ISS), held January 12-15th at Half Moon Bay in California, Shawn DuBravac, CEO, Avrio Institute, gave his insights on major trends in consumer electronics, with specific examples from the recent Consumer Electronics Show (CES).
ISS: The 2020 China Outlook
At SEMI’s 2020 Industry Strategy Symposium (ISS), held January 12-15th at Half Moon Bay in California, Handel Jones, CEO, International Business Strategies (IBS), spoke on the opportunities and threats in the China market.
ISS: The 2020 Market Outlook
At SEMI’s 2020 Industry Strategy Symposium (ISS), held January 12-15th at Half Moon Bay in California, Bob Johnson, vice president, Gartner, talked about the challenges ahead in the semiconductor market.
Acquisition of Solid State Technology Domain, Contents
I’m delighted to announce that we have successfully acquired the internet domains and content associated with Solid State Technology magazine. We are now working on integrating the well-known electroiq.com and solid-state. com domains into the semiconductor-digest.com family. The content from…
Differential Hall Effect Metrology Enables High Resolution Electrical Property Depth Profiling
Electrical property depth profile data from semiconductor films can be obtained using the Differential Hall Effect Metrology approach. The technique can yield sub-nm depth resolution for Si and Ge. For III-V compounds depth resolution is ~1 nm.
The Holistic Approach to Materials and Processing for New and Scaled Devices
Taking a holistic approach to materials integration considering the subtle effects of seemingly simple materials challenges is required to ensure performance, yield, reliability, and overall cost of ownership.
A Deep Dive into AI Chip Arithmetic Engines
Tesla’s autopilot chip executes 72-trillion additions and multiplications per second: It better get the math right
