The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today marks its 15-year anniversary at an annual meeting being held in conjunction with the SPIE Advanced Lithography + Patterning Conference in San Jose. FUJIFILM Corporation will be recognized at the event as the newest member joining more than 50 companies in the eBeam Initiative.
The eBeam Initiative also announces the publication of its fourth annual Deep Learning (DL) survey of its members’ products and applications using DL in the photomask-to-wafer manufacturing flow. The complete list of DL applications from 15 member companies can be found at www.ebeam.org.
“Over the 15-year history of the eBeam Initiative, all members have worked together to educate and promote the contributions of the mask industry to the semiconductor industry and to technology,” stated Aki Fujimura, CEO of D2S, the managing company sponsor of the eBeam Initiative. “We welcome FUJIFILM Corporation to the eBeam Initiative. As our first member from the chemical supply chain, they will bring much needed expertise on advances in resist technologies to our collective efforts.”
Added Fujimura, “Deep learning is essential now in semiconductor manufacturing. Both DL and curvilinear manufacturing, a significant trend in both the EUV and 193i lithography segments, are greatly improved through computation in the pixel space. Solutions in the pixel space benefit greatly in performance from GPU acceleration. These three trends – DL, curvilinear and GPU acceleration – will be our focus as we look at the eBeam Initiative’s educational agenda for this year.”
