EMD Electronics, the Electronics business of Merck KGaA, Darmstadt, Germany, in the U.S. and Canada, will participate in the 2023 International Society for Optics and Photonics (SPIE) Advanced Lithography & Patterning conference at the San Jose McEnergy Convention Center, Feb. 26-March 2, 2023.
“We are honored to be participating in the 2023 SPIE Advanced Lithography & Patterning conference, an event organized by the renowned international society for optics and photonics technology, SPIE,” said Anand Nambiar, Executive Vice President and Global Head of Semiconductor Materials. “EMD continues to value SPIE as the platform that provides us with the opportunity to share our advancements and insights with a wider audience, as well as to keep pace with the latest developments in the light-based fields of physics.”
As a leader in the industry, EMD Electronics has a legacy that includes the very invention of photoresist materials. The company has the background, expertise, and know-how required to support a variety of pattern transfer needs. EMD Electronics offers a range of capabilities that include conventional lithography processes, Extreme Ultraviolet (EUV) lithography, and complementary Directed Self-Assembly (DSA) approaches, as well as the latest tools, talent, and expertise that allow for customized solutions to be developed that will set a new standard in the industry.
Attendees of the conference are invited to visit EMD Electronics at the Welcome Reception, Mentor & Student Luncheon, and Career Networking Social, as well as to take part in various courses, technology and poster presentations that will be taking place throughout the event. Attendees may locate additional details and register via the schedule of the company’s participation below to meet EMD Electronics representatives.
The conference will also serve as a platform to announce the recognition of Key Account Manager, Warren Montgomery, as a 2023 SPIE Honorable Fellow Member. This prestigious distinction acknowledges his significant contributions to the fields of optics, photonics, and imaging, and adds to the already existing recognition of Research Fellow, Ralph Dammel, as an SPIE Honorable Fellow.
Warren, who has over 40 years of experience in the semiconductor industry and is known for his technical achievements such as the development of the SEMATECH Resist and Materials Development center and authorship of 35 patents and over 100 conference papers, has received numerous awards and honors, including IBM awards for material introduction, the SEMATECH Award for Resist Center Introduction, and the Best Paper award from Applied Materials. Additionally, Warren is known for his dedication to giving back to the optical community through his volunteer work and service to organizations such as SPIE, where he has held several committee and editorial positions and supported local schools and science fairs.
“Having two SPIE Honorable Fellow Members within our company is a testament to our commitment to excellence in optics, photonics, and imaging,” said Nambiar. “Warren’s recognition is a proud moment for us and reinforces our position as a prominent player in the industry and technology advancements.”
