Samco, a manufacturer of etching, deposition and surface treatment processing equipment for the semiconductor and related industries and academic facilities, is proud to introduce the new plasma etching cluster tool “Cluster H.”
“With our cutting-edge plasma etching technology, Cluster H provides the full-scale production capabilities for compound semiconductor devices such as high-frequency filters, SiC/GaN power devices, GaAs VCSELs, micro-OLED/LED, CMOS image sensors, and advanced packaging,” said Tsukasa Kawabe, President and COO of Samco.
“We created Cluster H to meet the strong demand from our valued customers for high throughput equipment. Cluster H with etching processes available only at Samco enables the combination of optimal materials and process technologies in advanced electronic device fabrication.” continued Tsukasa.
