TSMC commits to two tools for delivery next year Maybe, just maybe, ASML Holding N.V. (ASML) has made the near-impossible a reality by creating a cost-effective Extreme Ultra-Violet (EUV @ ~13.5nm wavelength) all-reflective lithographic tool. The company has announced that…
Chasing IC Yield when Every Atom Counts
Increasing fab costs coming for inspection and metrology At SEMICON West this year in Thursday morning’s Yield Breakfast sponsored by Entegris, top executives from Qualcomm, GlobalFoundries, and Applied Materials discussed the challenges to achieving profitable fab yield for atomic-scale devices…
Moore’s Law is Dead – (Part 2) When?
…economics of lithography slow scaling. Moore’s Law had been on life support ever since the industry started needing Double-Patterning (DP) at 1/4-pitch of 193nm optical lithography. EUV lithography shows slow and steady progress in source and resist technologies, and ASML…
